New TCR Materials

VxNb1-xOy thin films alloy have been fabricated on SiO2 substrates by reactive magnetron co-sputtering at room temperature, using plasma beam source to insert the oxygen to the chamber. Measurments of Influence of deposition parameters (such as oxygen partial pressure, vanadium in niobium percentage, and power of the plasma source) on the resistance and Temperature Coefficient of Resistance (TCR) were conducted. 2-probe measurement shows high TCR (up to -3.5 %/K) at 300k, and good uniformity, indicating it as a good candidate material for uncooled micro-bolometers. The samples were made at room temperature with no heat treatment in any stage of the process, which is different from today processes that require fabrication or post annealing at high temperature (above 200 °C).